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Hf-Based High-k Dielectrics Process Development, Performance Characterization, and Reliability
Hoofdkenmerken
Auteur: Kim, Young-Hee; Lee, Jack C.
Titel: Hf-Based High-k Dielectrics Process Development, Performance Characterization, and Reliability
Uitgever: Springer International
ISBN: 9783031014246
ISBN boekversie: 9783031025525
Serie: Synthesis Lectures on Solid State Materials and Devices
Land van oorsprong: Switzerland
Prijs: € 37.24
Verschijningsdatum: 31-12-2007
Bericht: Langere levertijd (2-3 weken)
Inhoudelijke kenmerken
Categorie: Electrical engineering
Geillustreerd: X, 92 p.
Technische kenmerken
Verschijningsvorm: Paperback / softback
Paginas: 92
Hoogte mm.: 235
Breedte mm.: 191
 

Inhoud:

Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).
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