\u003ci\u003eAdvances in Imaging and Electron Physics, Volume 229\u003c/i\u003e merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.\u003cul\u003e\u003cli\u003eProvides the authority and expertise of leading contributors from an international board of authors\u003c/li\u003e\u003cli\u003ePresents the latest release in the \u003ci\u003eAdvances in Imaging and Electron Physics\u003c/i\u003e series\u003c/li\u003e\u003c/ul\u003e
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